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Observation of ultralow-level Al impurities on a silicon surface by high-resolution grazing emission x-ray fluorescence excited by synchrotron radiation

  • Kubala-Kukus, A. Institute of Physics, Jan Kochanowski University, Kielce, Poland
  • Banas, D. Institute of Physics, Jan Kochanowski University, Kielce, Poland
  • Cao, Wei Department of Physics, University of Fribourg, Switzerland
  • Dousse, Jean-Claude Department of Physics, University of Fribourg, Switzerland
  • Hoszowska, Joanna Department of Physics, University of Fribourg, Switzerland
  • Kayser, Yves Department of Physics, University of Fribourg, Switzerland
  • Pajek, M. Institute of Physics, Jan Kochanowski University, Kielce, Poland
  • Salomé, M. European Synchrotron Radiation Facility (ESRF), Grenoble, France
  • Susini, J. European Synchrotron Radiation Facility (ESRF), Grenoble, France
  • Szlachetko, Jakub Institute of Physics, Jan Kochanowski University, Kielce, Poland - Department of Physics, University of Fribourg, Switzerland
  • Szlachetko, Monika Department of Physics, University of Fribourg, Switzerland
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    21.09.2009
Published in:
  • Physical Review B. - 2009, vol. 11, p. 113305
alumina
elemental semiconductors
fluorescence
Raman spectra
silicon
surface morphology
synchrotron radiation
X-ray emission spectra
English We demonstrate that ultralow-level Al impurities on a silicon surface can be measured by using the high-resolution grazing emission x-ray fluorescence (GEXRF) technique combined with synchrotron-radiation excitation. An Al-impurity level of about 10¹²  atoms/cm² was reached by observing the Al Kα x-ray fluorescence in the resonant Raman-scattering background-“free” regime by choosing an appropriate beam energy below the Si K absorption edge. Present results show that by combining the GEXRF method with the vapor phase decomposition technique the 10⁷  atoms/cm² level can be reached for Al detection on silicon. Finally, we found that the high-resolution GEXRF technique is a sensitive tool to study the morphology of surface nanostructures.
Faculty
Faculté des sciences et de médecine
Department
Département de Physique
Language
  • English
Classification
Physics
License
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Persistent URL
https://folia.unifr.ch/unifr/documents/301411
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