Timpu, FlaviaInstitute for Quantum Electronics, Department of Physics, ETH Zurich, Switzerland
Rauh, AstridPhysical Chemistry I, Heinrich-Heine-University Duesseldorf, Germany
Geisel, KarenPhysical Chemistry II, RWTH Aachen University, Aachen, Germany
Ellenbogen, TalDepartment of Physical Electronics, School of Electrical Engineering, Tel Aviv University, Israel
Grange, RachelInstitute for Quantum Electronics, Department of Physics, ETH Zurich, Switzerland
Scheffold, FrankDepartment of Physics, University of Fribourg, Switzerland
Karg, MatthiasPhysical Chemistry I, Heinrich-Heine-University Duesseldorf, Germany
Richtering, WalterPhysical Chemistry II, RWTH Aachen University, Aachen, Germany
Voelcker, Nicolas H.Drug Delivery, Disposition and Dynamics, Monash Institute of Pharmaceutical Sciences Monash University, Parkville, Australia - Melbourne Centre for Nanofabrication, Victorian Node of the Australian National Fabrication Facility, Clayton, Australia - INM-Leibniz Institute for New Materials, Saarbrücken, Germany
Isa, LucioLaboratory for Interfaces, Soft matter and Assembly, Department of Materials, ETH Zurich, Switzerland
Nanoscale. - 2018, vol. 10, no. 47, p. 22189–22195
English
The realization of non-close-packed nanoscale patterns with multiple feature sizes and length scales via colloidal self-assembly is a highly challenging task. We demonstrate here the creation of a variety of tunable particle arrays by harnessing the sequential self-assembly and deposition of two differently sized microgel particles at the fluid–fluid interface. The two-step process is essential to achieve a library of 2D binary colloidal alloys, which are kinetically inaccessible by direct co-assembly. These versatile binary patterns can be exploited for a range of end-uses. Here we show that they can for instance be transferred to silicon substrates, where they act as masks for the metal-assisted chemical etching of binary arrays of vertically aligned silicon nanowires (VA-SiNWs) with fine geometrical control. In particular, continuous binary gradients in both NW spacing and height can be achieved. Notably, these binary VA- SiNW platforms exhibit interesting anti-reflective properties in the visible range, in agreement with simulations. The proposed strategy can also be used for the precise placement of metallic nanoparticles in non-close-packed arrays. Sequential depositions of soft particles enable therefore the exploration of complex binary patterns, e.g. for the future development of substrates for biointerfaces, catalysis and controlled wetting.