Journal article

In situ monitoring of atomic layer epitaxy via optical ellipsometry

  • Lyzwa, Fryderyk Physikalisches Institut, Georg-August-Universität Göttingen, Germany - Department of Physics and Fribourg Center for Nanomaterials, University of Fribourg, Switzerland
  • Marsik, Premysl Department of Physics and Fribourg Center for Nanomaterials, University of Fribourg, Switzerland
  • Roddatis, V. Institut für Materialphysik, Georg-August-Universität Göttingen, Germany
  • Bernhard, Christian Department of Physics and Fribourg Center for Nanomaterials, University of Fribourg, Switzerland
  • Jungbauer, M. Physikalisches Institut, Georg-August-Universität Göttingen, Germany
  • Moshnyaga, V. Physikalisches Institut, Georg-August-Universität Göttingen, Germany
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    06.03.2018
Published in:
  • Journal of Physics D: Applied Physics. - 2018, vol. 51, no. 12, p. 125306
English We report on the use of time-resolved optical ellipsometry to monitor the deposition of single atomic layers with subatomic sensitivity. Ruddlesden–Popper thin films of SrO(SrTiO3) n=4 were grown by means of metalorganic aerosol deposition in the atomic layer epitaxy mode on SrTiO3(1 0 0), LSAT(1 0 0) and DyScO3(1 1 0) substrates. The measured time dependences of ellipsometric angles, Δ(t) and Ψ(t), were described by using a simple optical model, considering the sequence of atomic layers SrO and TiO2 with corresponding bulk refractive indices. As a result, valuable online information on the atomic layer epitaxy process was obtained. Ex situ characterization techniques, i.e. transmission electron microscopy, x-ray diffraction and x-ray reflectometry verify the crystal structure and confirm the predictions of optical ellipsometry.
Faculty
Faculté des sciences et de médecine
Department
Département de Physique
Language
  • English
Classification
Physics
License
License undefined
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Persistent URL
https://folia.unifr.ch/unifr/documents/306634
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