Photonic hyperuniform networks obtained by silicon double inversion of polymer templates
Muller, NicolasDepartment of Physics, University of Fribourg, Switzerland
Haberko, JakubFaculty of Physics and Applied Computer Science, AGH University of Science and Technology, Krakow, Poland
Marichy, CatherineDepartment of Physics, University of Fribourg, Switzerland - Université de Lyon, Laboratoire des Multimatériaux et Interfaces, Villeurbanne, Lyon, France
Scheffold, FrankDepartment of Physics, University of Fribourg, Switzerland
20.03.2017
Published in:
Optica. - 2017, vol. 4, no. 3, p. 361–366
English
Hyperuniform disordered networks belong to a peculiar class of structured materials predicted to display isotropic complete photonic bandgaps for a refractive index contrast larger than 3. The practical realization of such photonic designer materials is challenging, however, as it requires control over a multi-step fabrication process on optical length scales. Here we report the direct-laser writing of three-dimensional hyperuniform polymeric templates followed by a silicon double inversion procedure leading to high-quality network structures made of polycrystalline silicon. We observe a pronounced gap in the shortwave infrared centered at a wavelength of 𝜆Gap≃2.5 μm, in good agreement with numerical simulations. In the experiments the typical structural length scale can be varied between 2 and 1.54 μm, leading to a blueshift of the gap accompanied by an increase of the silicon filling fraction.