Journal article

High-resolution study of the x-ray resonant Raman scattering process around the 1s absorption edge for aluminium, silicon, and their oxides

  • Szlachetko, Jakub Department of Physics, University of Fribourg, Switzerland
  • Dousse, Jean-Claude Department of Physics, University of Fribourg, Switzerland
  • Berset, Michel Department of Physics, University of Fribourg, Switzerland
  • Fennane, Karima Department of Physics, University of Fribourg, Switzerland
  • Szlachetko, Monika Department of Physics, University of Fribourg, Switzerland
  • Hoszowska, Joanna Department of Physics, University of Fribourg, Switzerland - European Synchrotron Radiation Facility, Grenoble, France
  • Barrett, R. European Synchrotron Radiation Facility, Grenoble, France
  • Pajek, M. Biology II, Department for Neurobiology, Ludwig-Maximilians-University, Germany
  • Kubala-Kukus, A. Biology II, Department for Neurobiology, Ludwig-Maximilians-University, Germany
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    22.02.2007
Published in:
  • Physical Review A. - 2007, vol. 75, no. 2, p. 022512
English X-ray resonant Raman scattering (RRS) spectra of Al, Al₂O₃, Si, and SiO₂ were measured at the European Synchrotron Radiation Facility, using a high-resolution Bragg-type curved crystal spectrometer. The x-ray RRS spectra were collected at several beam energies tuned below the 1<i>s</i> absorption thresholds of Al and Si. Differences in the spectral features between the elemental samples and... Show more…
Faculty
Faculté des sciences
Department
Physique
Language
  • English
Classification
Physics
License
License undefined
Identifiers
Persistent URL
https://folia.unifr.ch/unifr/documents/300154