Resonant X-ray Raman scattering for Al, Si and their oxides

Szlachetko, Jakub; Berset, Michel; Dousse, Jean-Claude; Fennane, Karima; Szlachetko, Monika; Barrett, R.; Hoszowska, Joanna; Kubala-Kukus, A.; Pajek, M.

doi:10.1016/j.nimb.2005.06.075

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Journal article

Resonant X-ray Raman scattering for Al, Si and their oxides

Szlachetko, Jakub Department of Physics, University of Fribourg, Switzerland
Berset, Michel Department of Physics, University of Fribourg, Switzerland
Dousse, Jean-Claude Department of Physics, University of Fribourg, Switzerland
Fennane, Karima Department of Physics, University of Fribourg, Switzerland
Szlachetko, Monika Department of Physics, University of Fribourg, Switzerland
Barrett, R. European Synchrotron Radiation Facility, Grenoble, France
Hoszowska, Joanna European Synchrotron Radiation Facility, Grenoble, France
Kubala-Kukus, A. Swietokrzyska Academy, Institute of Physics, Kielce, Poland
Pajek, M. Swietokrzyska Academy, Institute of Physics, Kielce, Poland

01.08.2005

Published in:

Nuclear Instruments and Methods in Physics Research B: Beam Interactions with Materials and Atoms. - 2005, vol. 238, p. 353

Second order perturbation theory

English High-resolution measurements of the resonant X-ray Raman scattering (RRS) of Al and Si and their oxides were performed at the European Synchrotron Radiation Facility (ESRF) in Grenoble, France, using a von Hamos Bragg-type curved crystal spectrometer. To probe the influence of chemical effects on the RRS X-ray spectra, Al₂O₃ and SiO₂ samples were also investigated. The X-ray RRS spectra were measured at different photon beam energies tuned below the K-absorption edge. The measured spectra are compared to results of RRS calculations based on the second- order perturbation theory within the Kramers–Heisenberg approach.

Faculty

Faculté des sciences et de médecine

Department

Département de Physique

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