Structural and optical properties of MgxAl1-xHy gradient thin films: a combinatorial approach
      
      
        
      
      
      
      
        
          
          - 
            
Gremaud, Robin
Department of Physics and Astronomy, Condensed Matter Physics, Vrije Universiteit, Amsterdam, The Netherlands
          
- 
            
Borgschulte, A.
Department of Physics and Astronomy, Condensed Matter Physics, Vrije Universiteit, Amsterdam, The Netherlands
          
- 
            
Chacon, C.
Department of Physics, Uppsala University, Sweden
          
- 
            
Mechelen, J. L. M. van
Department of Physics and Astronomy, Condensed Matter Physics, Vrije Universiteit, Amsterdam, The Netherlands
          
- 
            
Schreuders, H.
Department of Physics and Astronomy, Condensed Matter Physics, Vrije Universiteit, Amsterdam, The Netherlands
          
- 
            
Züttel, Andreas
  Institut de Physique, Université de Fribourg, Switzerland
          
- 
            
Hjörvarsson, B.
Department of Physics, Uppsala University, Sweden
          
- 
            
Dam, B.
Department of Physics and Astronomy, Condensed Matter Physics, Vrije Universiteit, Amsterdam, The Netherlands
          
- 
            
Griessen, R.
Department of Physics and Astronomy, Condensed Matter Physics, Vrije Universiteit, Amsterdam, The Netherlands
          
Show more… 
      
      
      
      
      
      
      
      
      
      
      
      
      
      
      
        
        Published in:
        
          
            
            - Applied Physics A. - 2006, vol. 84, no. 1-2, p. 77-85
 
       
      
      
      
       
      
      
      
        
        English
        
        
        
          The structural, optical and dc electrical properties of MgxAl1-x (0.2≤x≤0.9) gradient thin films covered with Pd/Mg are investigated before and after exposure to hydrogen. We use hydrogenography, a novel high-throughput optical technique, to map simultaneously all the hydride forming compositions and the kinetics thereof in the gradient thin film. Metallic Mg in the MgxAl1-x layer undergoes a metal-to-semiconductor transition and MgH₂ is formed for all Mg fractions x investigated. The presence of an amorphous Mg-Al phase in the thin film phase diagram enhances strongly the kinetics of hydrogenation. In the Al-rich part of the film, a complex H-induced segregation of MgH₂ and Al occurs. This uncommon large-scale segregation is evidenced by metal and hydrogen profiling using Rutherford backscattering spectrometry and resonant nuclear analysis based on the reaction ¹H(¹⁵N,αγ)¹²C. Besides MgH₂, an additional semiconducting phase is found by electrical conductivity measurements around an atomic [Al]/[Mg] ratio of 2 (x=0.33). This suggests that the film is partially transformed into Mg(AlH₄)₂ at around this composition.
        
        
       
      
      
      
        
        
        
        
        
        
        
        - 
          
          
          Faculty
          
        
- Faculté des sciences et de médecine
- 
          
          
          Department
          
        
- Département de Physique
- 
          Language
        
- 
          
        
- 
          Classification
        
- 
          
              
                
                  Physics
                
              
            
          
        
- 
          License
        
- 
          
        
- 
          Identifiers
        
- 
          
        
- 
          Persistent URL
        
- 
          https://folia.unifr.ch/unifr/documents/299964
        
 
   
  
  
  Statistics
  
  
    
      Document views: 112
      
File downloads: