Journal article
The Reactive Ion Etching of Tantalum Silicide/Polysilicon Bilayers in Silicon Tetrachloride and Hydrogen Chloride
- Curtis, B. J. Paul Scherrer Institute, c/o Laboratories RCA, Badenerstrasse 569, 8048 Zurich, Switzerland
- Brunner, H. R. Paul Scherrer Institute, c/o Laboratories RCA, Badenerstrasse 569, 8048 Zurich, Switzerland
- 2019-12-7
Published in:
- Journal of The Electrochemical Society. - The Electrochemical Society. - 1989, vol. 136, no. 5, p. 1463-1468
Renewable Energy, Sustainability and the Environment
Electrochemistry
Materials Chemistry
Electronic, Optical and Magnetic Materials
Surfaces, Coatings and Films
Condensed Matter Physics
- Language
-
- English
- Open access status
- closed
- Identifiers
-
- DOI 10.1149/1.2096942
- ISSN 0013-4651
- Persistent URL
- https://folia.unifr.ch/global/documents/86498
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