Lyzwa, Fryderyk Marsik, Premysl Roddatis, V. Bernhard, Christian Jungbauer, M. Moshnyaga, V. 2018-03-06 We report on the use of time-resolved optical ellipsometry to monitor the deposition of single atomic layers with subatomic sensitivity. Ruddlesden–Popper thin films of SrO(SrTiO3) n=4 were grown by means of metalorganic aerosol deposition in the atomic layer epitaxy mode on SrTiO3(1 0 0), LSAT(1 0 0) and DyScO3(1 1 0) substrates. The measured time dependences of ellipsometric angles, Δ(t) and Ψ(t), were described by using a simple optical model, considering the sequence of atomic layers SrO and TiO2 with corresponding bulk refractive indices. As a result, valuable online information on the atomic layer epitaxy process was obtained. Ex situ characterization techniques, i.e. transmission electron microscopy, x-ray diffraction and x-ray reflectometry verify the crystal structure and confirm the predictions of optical ellipsometry. application/pdf https://folia.unifr.ch/global/documents/306634 https://folia.unifr.ch/documents/306634/files/ber_ism.pdf eng info:eu-repo/semantics/altIdentifier/doi/10.1088/1361-6463/aaac64 info:eu-repo/semantics/openAccess License undefined Journal of Physics D: Applied Physics. - 2018, vol. 51, no. 12, p. 125306 info:eu-repo/classification/udc/53 In situ monitoring of atomic layer epitaxy via optical ellipsometry http://purl.org/coar/resource_type/c_6501