<oai_dc:dc xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
  <dc:creator>Chachereau, A.</dc:creator>
  <dc:creator>Fedor, Juraj</dc:creator>
  <dc:creator>Janečková, Radmila</dc:creator>
  <dc:creator>Kočišek, J.</dc:creator>
  <dc:creator>Rabie, M.</dc:creator>
  <dc:creator>Franck, C. M.</dc:creator>
  <dc:date>2016</dc:date>
  <dc:description xmlns:ns0="xml" ns0:lang="en">The electron attachment properties of octafluorotetrahydrofuran (c-C₄F₈O) are  investigated using two complementary experimental setups. The attachment and  ionization cross sections of c-C₄F₈O are measured using an electron beam  experiment. The effective ionization rate coefficient, electron drift velocity and electron  diffusion coefficient in c-C₄F₈O diluted to concentrations lower than 0.6% in the buffer  gases N₂, CO₂ and Ar, are measured using a pulsed Townsend experiment. A kinetic  model is proposed, which combines the results of the two experiments.</dc:description>
  <dc:format>application/pdf</dc:format>
  <dc:identifier>https://folia.unifr.ch/global/documents/305242</dc:identifier>
  <dc:identifier>https://folia.unifr.ch/documents/305242/files/fed_eap.pdf</dc:identifier>
  <dc:language>eng</dc:language>
  <dc:relation>info:eu-repo/semantics/altIdentifier/doi/10.1088/0022-3727/49/37/375201</dc:relation>
  <dc:rights>info:eu-repo/semantics/openAccess</dc:rights>
  <dc:rights>License undefined</dc:rights>
  <dc:source>Journal of Physics D: Applied Physics. - 2016, vol. 49, no. 37, p. 375201</dc:source>
  <dc:subject>info:eu-repo/classification/udc/54</dc:subject>
  <dc:title xmlns:ns1="xml" ns1:lang="en">Electron attachment properties of c-C₄F₈O in different environments</dc:title>
  <dc:type>http://purl.org/coar/resource_type/c_6501</dc:type>
</oai_dc:dc>